Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
10.1088/0268-1242/18/7/101
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| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Others |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/111657 |
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| Institution: | National University of Singapore |
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