Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

10.1016/S0168-9002(01)00887-7

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Main Authors:	Dattoli, G., Doria, A., Gallerano, G.P., Giannessi, L., Hesch, K., Moser, H.O., Ottaviani, P.L., Pellegrin, E., Rossmanith, R., Steininger, R., Saile, V., Wüst, J.
Other Authors:	SINGAPORE SYNCHROTRON LIGHT SOURCE
Format:	Article
Published:	2014
Subjects:	Lithography Radiation by moving charges Synchrotron radiation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113016
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113016
record_format	dspace
spelling	sg-nus-scholar.10635-1130162024-11-12T18:42:07Z Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation Dattoli, G. Doria, A. Gallerano, G.P. Giannessi, L. Hesch, K. Moser, H.O. Ottaviani, P.L. Pellegrin, E. Rossmanith, R. Steininger, R. Saile, V. Wüst, J. SINGAPORE SYNCHROTRON LIGHT SOURCE Lithography Radiation by moving charges Synchrotron radiation 10.1016/S0168-9002(01)00887-7 Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 474 3 259-272 NIMAE 2014-11-28T08:43:16Z 2014-11-28T08:43:16Z 2001-12-11 Article Dattoli, G., Doria, A., Gallerano, G.P., Giannessi, L., Hesch, K., Moser, H.O., Ottaviani, P.L., Pellegrin, E., Rossmanith, R., Steininger, R., Saile, V., Wüst, J. (2001-12-11). Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 474 (3) : 259-272. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-9002(01)00887-7 01689002 http://scholarbank.nus.edu.sg/handle/10635/113016 000172609500007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Lithography Radiation by moving charges Synchrotron radiation
spellingShingle	Lithography Radiation by moving charges Synchrotron radiation Dattoli, G. Doria, A. Gallerano, G.P. Giannessi, L. Hesch, K. Moser, H.O. Ottaviani, P.L. Pellegrin, E. Rossmanith, R. Steininger, R. Saile, V. Wüst, J. Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
description	10.1016/S0168-9002(01)00887-7
author2	SINGAPORE SYNCHROTRON LIGHT SOURCE
author_facet	SINGAPORE SYNCHROTRON LIGHT SOURCE Dattoli, G. Doria, A. Gallerano, G.P. Giannessi, L. Hesch, K. Moser, H.O. Ottaviani, P.L. Pellegrin, E. Rossmanith, R. Steininger, R. Saile, V. Wüst, J.
format	Article
author	Dattoli, G. Doria, A. Gallerano, G.P. Giannessi, L. Hesch, K. Moser, H.O. Ottaviani, P.L. Pellegrin, E. Rossmanith, R. Steininger, R. Saile, V. Wüst, J.
author_sort	Dattoli, G.
title	Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
title_short	Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
title_full	Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
title_fullStr	Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
title_full_unstemmed	Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
title_sort	extreme ultraviolet (euv) sources for lithography based on synchrotron radiation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113016
_version_	1821181974329425920

Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

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