Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

10.1016/S0168-9002(01)00887-7

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Bibliographic Details
Main Authors:	Dattoli, G., Doria, A., Gallerano, G.P., Giannessi, L., Hesch, K., Moser, H.O., Ottaviani, P.L., Pellegrin, E., Rossmanith, R., Steininger, R., Saile, V., Wüst, J.
Other Authors:	SINGAPORE SYNCHROTRON LIGHT SOURCE
Format:	Article
Published:	2014
Subjects:	Lithography Radiation by moving charges Synchrotron radiation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113016
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Institution:	National University of Singapore

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