Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation

10.1016/S0168-9002(01)00887-7

Saved in:
Bibliographic Details
Main Authors: Dattoli, G., Doria, A., Gallerano, G.P., Giannessi, L., Hesch, K., Moser, H.O., Ottaviani, P.L., Pellegrin, E., Rossmanith, R., Steininger, R., Saile, V., Wüst, J.
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Article
Published: 2014
Subjects:
Lithography
Radiation by moving charges
Synchrotron radiation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113016
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113016

Similar Items