Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology
Materials Research Society Symposium - Proceedings
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2014
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sg-nus-scholar.10635-1131122015-03-04T11:59:39Z Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology Chen, S.Y. Shen, Z.X. Xu, S.Y. See, A.K. Chan, L.H. Li, W.S. PHYSICS INSTITUTE OF ENGINEERING SCIENCE Materials Research Society Symposium - Proceedings 670 K641-K646 MRSPD 2014-11-28T09:12:09Z 2014-11-28T09:12:09Z 2001 Conference Paper Chen, S.Y.,Shen, Z.X.,Xu, S.Y.,See, A.K.,Chan, L.H.,Li, W.S. (2001). Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology. Materials Research Society Symposium - Proceedings 670 : K641-K646. ScholarBank@NUS Repository. 02729172 http://scholarbank.nus.edu.sg/handle/10635/113112 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
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Singapore |
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Materials Research Society Symposium - Proceedings |
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PHYSICS |
| author_facet |
PHYSICS Chen, S.Y. Shen, Z.X. Xu, S.Y. See, A.K. Chan, L.H. Li, W.S. |
| format |
Conference or Workshop Item |
| author |
Chen, S.Y. Shen, Z.X. Xu, S.Y. See, A.K. Chan, L.H. Li, W.S. |
| spellingShingle |
Chen, S.Y. Shen, Z.X. Xu, S.Y. See, A.K. Chan, L.H. Li, W.S. Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| author_sort |
Chen, S.Y. |
| title |
Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| title_short |
Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| title_full |
Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| title_fullStr |
Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| title_full_unstemmed |
Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology |
| title_sort |
direct formation of c54 phase on the basis of c40 tisi2 and its applications in deep sub-micron technology |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/113112 |
| _version_ |
1681094605439762432 |