Excellent surface passivation of silicon at low cost: Atomic layer deposited aluminium oxide from solar grade TMA

Excellent surface passivation of silicon at low cost: Atomic layer deposited aluminium oxide from solar grade TMA

10.1109/PVSC.2013.6744372

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Bibliographic Details
Main Authors: Lin, F., Nandakumar, N., Dielissen, B., Gortzen, R., Hoex, B.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: 2014
Subjects:
Aluminium oxide
Atomic layer deposition
Cost of ownership
Solar grade
Surface passivation
TMA
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113257
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113257

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