Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

• Main Authors: Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Atomic layer deposition; Hafnium oxide; Surface passivation
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/113261
• 機構: National University of Singapore

10.1016/j.egypro.2012.02.010