Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

10.1016/j.egypro.2012.02.010

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Bibliographic Details
Main Authors: Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: 2014
Subjects:
Atomic layer deposition
Hafnium oxide
Surface passivation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113261
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113261

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