Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

10.1016/j.egypro.2012.02.010

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Bibliographic Details
Main Authors:	Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Atomic layer deposition Hafnium oxide Surface passivation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113261
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113261
record_format	dspace
spelling	sg-nus-scholar.10635-1132612024-11-12T21:35:13Z Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G. ELECTRICAL & COMPUTER ENGINEERING SOLAR ENERGY RESEARCH INST OF S'PORE Atomic layer deposition Hafnium oxide Surface passivation 10.1016/j.egypro.2012.02.010 Energy Procedia 15 84-90 2014-11-30T06:41:29Z 2014-11-30T06:41:29Z 2012 Conference Paper Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G. (2012). Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films. Energy Procedia 15 : 84-90. ScholarBank@NUS Repository. https://doi.org/10.1016/j.egypro.2012.02.010 18766102 http://scholarbank.nus.edu.sg/handle/10635/113261 000306068100010 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Atomic layer deposition Hafnium oxide Surface passivation
spellingShingle	Atomic layer deposition Hafnium oxide Surface passivation Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G. Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
description	10.1016/j.egypro.2012.02.010
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G.
format	Conference or Workshop Item
author	Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G.
author_sort	Lin, F.
title	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_short	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_full	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_fullStr	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_full_unstemmed	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_sort	low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113261
_version_	1821209570690727936

Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

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