Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

10.1016/j.egypro.2012.02.010

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Bibliographic Details
Main Authors:	Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G.
Other Authors:	SOLAR ENERGY RESEARCH INST OF S'PORE
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Atomic layer deposition Hafnium oxide Surface passivation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113261
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113261
record_format	dspace
spelling	sg-nus-scholar.10635-1132612023-10-29T21:41:02Z Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G. SOLAR ENERGY RESEARCH INST OF S'PORE ELECTRICAL & COMPUTER ENGINEERING Atomic layer deposition Hafnium oxide Surface passivation 10.1016/j.egypro.2012.02.010 Energy Procedia 15 84-90 2014-11-30T06:41:29Z 2014-11-30T06:41:29Z 2012 Conference Paper Lin, F., Hoex, B., Koh, Y.H., Lin, J.J., Aberle, A.G. (2012). Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films. Energy Procedia 15 : 84-90. ScholarBank@NUS Repository. https://doi.org/10.1016/j.egypro.2012.02.010 18766102 http://scholarbank.nus.edu.sg/handle/10635/113261 000306068100010 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Atomic layer deposition Hafnium oxide Surface passivation
spellingShingle	Atomic layer deposition Hafnium oxide Surface passivation Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G. Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
description	10.1016/j.egypro.2012.02.010
author2	SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet	SOLAR ENERGY RESEARCH INST OF S'PORE Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G.
format	Conference or Workshop Item
author	Lin, F. Hoex, B. Koh, Y.H. Lin, J.J. Aberle, A.G.
author_sort	Lin, F.
title	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_short	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_full	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_fullStr	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_full_unstemmed	Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
title_sort	low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113261
_version_	1781789183684116480

Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide films

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