Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

10.1016/S1001-8042(06)60038-9

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Bibliographic Details
Main Authors: PAN, J.S.P, LIU, R.S.L, TOK, E.S.T
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
AFM
Cobalt
Diffusion
Growth mode
Hydrogen termination
Metal-semiconductor interfacial reaction
Silicon
Surface morphology
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115885
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/115885

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