Probing Co/Si interface behaviour by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

• Main Authors: PAN, J.S.P, LIU, R.S.L, TOK, E.S.T
• 其他作者: INSTITUTE OF ENGINEERING SCIENCE
• 格式: Article
• 出版: 2014
• 主題: AFM; Cobalt; Diffusion; Growth mode; Hydrogen termination; Metal-semiconductor interfacial reaction; Silicon; Surface morphology; XPS
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/115885
• 機構: National University of Singapore

10.1016/S1001-8042(06)60038-9