Advanced process/equipment control for thermal processing in lithography

Advanced process/equipment control for thermal processing in lithography

Ph.D

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Bibliographic Details
Main Author: WU XIAODONG
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
process control, lithography, temperature, uniformity
Online Access:http://scholarbank.nus.edu.sg/handle/10635/12970
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-129702017-10-21T09:28:30Z Advanced process/equipment control for thermal processing in lithography WU XIAODONG ELECTRICAL & COMPUTER ENGINEERING TAY EE BENG, ARTHUR HO WENG KHUEN process control, lithography, temperature, uniformity Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:28:51Z 2010-04-08T10:28:51Z 2008-01-23 Thesis WU XIAODONG (2008-01-23). Advanced process/equipment control for thermal processing in lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/12970 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic process control, lithography, temperature, uniformity
spellingShingle process control, lithography, temperature, uniformity
WU XIAODONG
Advanced process/equipment control for thermal processing in lithography
description Ph.D
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
WU XIAODONG
format Theses and Dissertations
author WU XIAODONG
author_sort WU XIAODONG
title Advanced process/equipment control for thermal processing in lithography
title_short Advanced process/equipment control for thermal processing in lithography
title_full Advanced process/equipment control for thermal processing in lithography
title_fullStr Advanced process/equipment control for thermal processing in lithography
title_full_unstemmed Advanced process/equipment control for thermal processing in lithography
title_sort advanced process/equipment control for thermal processing in lithography
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/12970
_version_ 1681078777833062400

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