In-situ measurement and control of photoresist processing in lithography
Ph.D
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2010
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sg-nus-scholar.10635-130092017-10-21T09:30:48Z In-situ measurement and control of photoresist processing in lithography HU NI ELECTRICAL & COMPUTER ENGINEERING TAY EE BENG, ARTHUR HO WENG KHUEN lithography; semiconductor manufacturing; in-situ measurement; real-time control; temperature control; development process control Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:29:11Z 2010-04-08T10:29:11Z 2007-12-26 Thesis HU NI (2007-12-26). In-situ measurement and control of photoresist processing in lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13009 NOT_IN_WOS en |
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National University of Singapore |
building |
NUS Library |
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Singapore |
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ScholarBank@NUS |
language |
English |
topic |
lithography; semiconductor manufacturing; in-situ measurement; real-time control; temperature control; development process control |
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lithography; semiconductor manufacturing; in-situ measurement; real-time control; temperature control; development process control HU NI In-situ measurement and control of photoresist processing in lithography |
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Ph.D |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING HU NI |
format |
Theses and Dissertations |
author |
HU NI |
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HU NI |
title |
In-situ measurement and control of photoresist processing in lithography |
title_short |
In-situ measurement and control of photoresist processing in lithography |
title_full |
In-situ measurement and control of photoresist processing in lithography |
title_fullStr |
In-situ measurement and control of photoresist processing in lithography |
title_full_unstemmed |
In-situ measurement and control of photoresist processing in lithography |
title_sort |
in-situ measurement and control of photoresist processing in lithography |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/13009 |
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1681078784390856704 |