In-situ measurement and control of photoresist processing in lithography
Ph.D
Saved in:
Main Author: | HU NI |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2010
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/13009 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Language: | English |
Similar Items
-
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
by: Wu, X., et al.
Published: (2014) -
Real-time spatial control of photoresist development rate
by: Tay, A., et al.
Published: (2014) -
In-situ measurement and control for photoresist processing in microlithography
by: Tay, A., et al.
Published: (2014) -
In-situ measurement & control of photoresist development in microlithography
by: Kiew, C.M., et al.
Published: (2014) -
Integrated bake/chill module with in situ temperature measurement for photoresist processing
by: Tay, A., et al.
Published: (2014)