Hafnium oxide based high-k dielectric gate stack

Ph.D

Saved in:

Bibliographic Details
Main Author:	LI QIN
Other Authors:	PHYSICS
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	High-k dielectric,Metal/HfO2/semiconductor,Band alignment,Schottky barrier height,X-ray photoelectron spectroscopy,Density functional theory
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/13035
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-13035
record_format	dspace
spelling	sg-nus-scholar.10635-130352017-10-21T09:32:13Z Hafnium oxide based high-k dielectric gate stack LI QIN PHYSICS ONG CHONG KIM High-k dielectric,Metal/HfO2/semiconductor,Band alignment,Schottky barrier height,X-ray photoelectron spectroscopy,Density functional theory Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:29:23Z 2010-04-08T10:29:23Z 2008-02-20 Thesis LI QIN (2008-02-20). Hafnium oxide based high-k dielectric gate stack. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13035 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	High-k dielectric,Metal/HfO2/semiconductor,Band alignment,Schottky barrier height,X-ray photoelectron spectroscopy,Density functional theory
spellingShingle	High-k dielectric,Metal/HfO2/semiconductor,Band alignment,Schottky barrier height,X-ray photoelectron spectroscopy,Density functional theory LI QIN Hafnium oxide based high-k dielectric gate stack
description	Ph.D
author2	PHYSICS
author_facet	PHYSICS LI QIN
format	Theses and Dissertations
author	LI QIN
author_sort	LI QIN
title	Hafnium oxide based high-k dielectric gate stack
title_short	Hafnium oxide based high-k dielectric gate stack
title_full	Hafnium oxide based high-k dielectric gate stack
title_fullStr	Hafnium oxide based high-k dielectric gate stack
title_full_unstemmed	Hafnium oxide based high-k dielectric gate stack
title_sort	hafnium oxide based high-k dielectric gate stack
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/13035
_version_	1681078788833673216

Hafnium oxide based high-k dielectric gate stack

Similar Items