Stress-induced leakage current in dual-gate CMOSFETS with thin nitrided gate oxides

Stress-induced leakage current in dual-gate CMOSFETS with thin nitrided gate oxides

Master's

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Bibliographic Details
Main Author: HUANG JINSHENG
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Stress-induced leakage current, dual gate CMOSFETs, thin nitrided gate oxides
Online Access:http://scholarbank.nus.edu.sg/handle/10635/14491
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Institution: National University of Singapore
Language: English

Internet

http://scholarbank.nus.edu.sg/handle/10635/14491

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