Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films

Master's

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Main Author: TOK KWEE LEE
Other Authors: PHYSICS
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/14747
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-147472017-10-21T05:47:41Z Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films TOK KWEE LEE PHYSICS WEE THYE SHEN, ANDREW high-k dielectric, atomic layer deposition, thermal stability, XPS, SIMS, diffusion Master's MASTER OF SCIENCE 2010-04-08T10:46:21Z 2010-04-08T10:46:21Z 2005-05-31 Thesis TOK KWEE LEE (2005-05-31). Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/14747 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic high-k dielectric, atomic layer deposition, thermal stability, XPS, SIMS, diffusion
spellingShingle high-k dielectric, atomic layer deposition, thermal stability, XPS, SIMS, diffusion
TOK KWEE LEE
Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
description Master's
author2 PHYSICS
author_facet PHYSICS
TOK KWEE LEE
format Theses and Dissertations
author TOK KWEE LEE
author_sort TOK KWEE LEE
title Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
title_short Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
title_full Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
title_fullStr Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
title_full_unstemmed Physical characterization of HfO2 & HfO2-Al2O3 alloy thin films
title_sort physical characterization of hfo2 & hfo2-al2o3 alloy thin films
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/14747
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