CHARACTERIZATION STUDY ON THE BEHAVIOR OF N-DOPED RESISTIVITY BETWEEN SINGLE CRYSTALLINE AND POLY-CRYSTALLINE WAFERS

CHARACTERIZATION STUDY ON THE BEHAVIOR OF N-DOPED RESISTIVITY BETWEEN SINGLE CRYSTALLINE AND POLY-CRYSTALLINE WAFERS

Master's

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Bibliographic Details
Main Author: YONG FOO NUN
Other Authors: SINGAPORE-MIT ALLIANCE
Format: Theses and Dissertations
Published: 2019
Subjects:
POCl3 doping
Resistivity uniformity
Doping process bias
JMP 6.0
Statistical Process Control
Design of Experiment
Plackett-Burman design
Response surface methodology
n-diffusion sheet resistance (RS_NP)
Pull-down polysilicon sheet resistance (RS_PL)
Online Access:https://scholarbank.nus.edu.sg/handle/10635/153912
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Institution: National University of Singapore

Internet

https://scholarbank.nus.edu.sg/handle/10635/153912

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