CHARACTERIZATION STUDY ON THE BEHAVIOR OF N-DOPED RESISTIVITY BETWEEN SINGLE CRYSTALLINE AND POLY-CRYSTALLINE WAFERS

• Main Author: YONG FOO NUN
• Other Authors: SINGAPORE-MIT ALLIANCE
• Format: Theses and Dissertations
• Published: 2019
• Subjects: POCl3 doping; Resistivity uniformity; Doping process bias; JMP 6.0; Statistical Process Control; Design of Experiment; Plackett-Burman design; Response surface methodology; n-diffusion sheet resistance (RS_NP); Pull-down polysilicon sheet resistance (RS_PL)
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/153912
• Institution: National University of Singapore

Master's