ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES

Master's

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Bibliographic Details
Main Author: MADHAVAN PANDURANGAN
Other Authors: SINGAPORE-MIT ALLIANCE
Format: Theses and Dissertations
Published: 2019
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/154128
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1541282019-05-15T13:14:40Z ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES MADHAVAN PANDURANGAN SINGAPORE-MIT ALLIANCE JAGAR SINGH Electron beam Proximity effect Back scattering Post exposure bake Sensitivity Chemically amplified resist Master's MASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS 2019-05-15T04:18:26Z 2019-05-15T04:18:26Z 2003 Thesis MADHAVAN PANDURANGAN (2003). ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/154128 SMA BATCHLOAD 20190422
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Electron beam
Proximity effect
Back scattering
Post exposure bake
Sensitivity
Chemically amplified resist
spellingShingle Electron beam
Proximity effect
Back scattering
Post exposure bake
Sensitivity
Chemically amplified resist
MADHAVAN PANDURANGAN
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
description Master's
author2 SINGAPORE-MIT ALLIANCE
author_facet SINGAPORE-MIT ALLIANCE
MADHAVAN PANDURANGAN
format Theses and Dissertations
author MADHAVAN PANDURANGAN
author_sort MADHAVAN PANDURANGAN
title ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
title_short ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
title_full ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
title_fullStr ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
title_full_unstemmed ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
title_sort electron beam lithography for sub-100nm devices
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/154128
_version_ 1681099341525155840