ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES
Master's
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2019
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sg-nus-scholar.10635-1541282019-05-15T13:14:40Z ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES MADHAVAN PANDURANGAN SINGAPORE-MIT ALLIANCE JAGAR SINGH Electron beam Proximity effect Back scattering Post exposure bake Sensitivity Chemically amplified resist Master's MASTER OF SCIENCE IN ADVANCED MATERIALS FOR MICRO- & NANO- SYSTEMS 2019-05-15T04:18:26Z 2019-05-15T04:18:26Z 2003 Thesis MADHAVAN PANDURANGAN (2003). ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/154128 SMA BATCHLOAD 20190422 |
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National University of Singapore |
building |
NUS Library |
country |
Singapore |
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ScholarBank@NUS |
topic |
Electron beam Proximity effect Back scattering Post exposure bake Sensitivity Chemically amplified resist |
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Electron beam Proximity effect Back scattering Post exposure bake Sensitivity Chemically amplified resist MADHAVAN PANDURANGAN ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
description |
Master's |
author2 |
SINGAPORE-MIT ALLIANCE |
author_facet |
SINGAPORE-MIT ALLIANCE MADHAVAN PANDURANGAN |
format |
Theses and Dissertations |
author |
MADHAVAN PANDURANGAN |
author_sort |
MADHAVAN PANDURANGAN |
title |
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
title_short |
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
title_full |
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
title_fullStr |
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
title_full_unstemmed |
ELECTRON BEAM LITHOGRAPHY FOR SUB-100NM DEVICES |
title_sort |
electron beam lithography for sub-100nm devices |
publishDate |
2019 |
url |
https://scholarbank.nus.edu.sg/handle/10635/154128 |
_version_ |
1681099341525155840 |