Gate stack engineering of germanium mosfets with high-K dielectrics
Ph.D
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sg-nus-scholar.10635-155582015-01-09T15:55:16Z Gate stack engineering of germanium mosfets with high-K dielectrics WU NAN ELECTRICAL & COMPUTER ENGINEERING ZHU CHUNXIANG semiconductor, MOS, transistor, germanium, high-k, dielectric Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:54:51Z 2010-04-08T10:54:51Z 2006-11-24 Thesis WU NAN (2006-11-24). Gate stack engineering of germanium mosfets with high-K dielectrics. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15558 NOT_IN_WOS en |
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National University of Singapore |
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Singapore |
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ScholarBank@NUS |
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semiconductor, MOS, transistor, germanium, high-k, dielectric |
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semiconductor, MOS, transistor, germanium, high-k, dielectric WU NAN Gate stack engineering of germanium mosfets with high-K dielectrics |
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Ph.D |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING WU NAN |
format |
Theses and Dissertations |
author |
WU NAN |
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WU NAN |
title |
Gate stack engineering of germanium mosfets with high-K dielectrics |
title_short |
Gate stack engineering of germanium mosfets with high-K dielectrics |
title_full |
Gate stack engineering of germanium mosfets with high-K dielectrics |
title_fullStr |
Gate stack engineering of germanium mosfets with high-K dielectrics |
title_full_unstemmed |
Gate stack engineering of germanium mosfets with high-K dielectrics |
title_sort |
gate stack engineering of germanium mosfets with high-k dielectrics |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/15558 |
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