The effect of hydrogen doping on the electrochemical etching of ion/irradiated n/type silicon

The effect of hydrogen doping on the electrochemical etching of ion/irradiated n/type silicon

10.1149/2.0141808jss

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Bibliographic Details
Main Authors: Liang, H.D., Breese, M.B.H., Duttagupta, S., Aberle, A.G., Bettiol, A.A., Venkatesan, T.
Other Authors: NUS NANOSCIENCE & NANOTECH INITIATIVE
Format: Article
Published: Electrochemical Society Inc. 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/168594
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Institution: National University of Singapore
Description
Summary:10.1149/2.0141808jss

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