Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation

10.1016/j.apsusc.2014.11.180

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Bibliographic Details
Main Authors:	Meddeb, H, Bearda, T, Payo, M Recaman, Abdelwahab, I, Abdulraheem, Y, Ezzaouia, H, Gordon, I, Szlufcik, J, Poortmans, J
Other Authors:	DEPT OF CHEMISTRY
Format:	Article
Language:	English
Published:	ELSEVIER 2020
Subjects:	Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Wet chemical cleaning Surface treatment Intrinsic amorphous silicon Boron emitter Passivat ion Annealing P-TYPE RECOMBINATION INTERFACES
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/170787
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-170787
record_format	dspace
spelling	sg-nus-scholar.10635-1707872020-06-30T13:22:51Z Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation Meddeb, H Bearda, T Payo, M Recaman Abdelwahab, I Abdulraheem, Y Ezzaouia, H Gordon, I Szlufcik, J Poortmans, J DEPT OF CHEMISTRY Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Wet chemical cleaning Surface treatment Intrinsic amorphous silicon Boron emitter Passivat ion Annealing P-TYPE RECOMBINATION INTERFACES 10.1016/j.apsusc.2014.11.180 APPLIED SURFACE SCIENCE 328 140-145 2020-06-30T07:32:47Z 2020-06-30T07:32:47Z 2015-02-15 2020-06-30T06:21:47Z Article Meddeb, H, Bearda, T, Payo, M Recaman, Abdelwahab, I, Abdulraheem, Y, Ezzaouia, H, Gordon, I, Szlufcik, J, Poortmans, J (2015-02-15). Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation. APPLIED SURFACE SCIENCE 328 : 140-145. ScholarBank@NUS Repository. https://doi.org/10.1016/j.apsusc.2014.11.180 0169-4332 1873-5584 https://scholarbank.nus.edu.sg/handle/10635/170787 en ELSEVIER Elements
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Wet chemical cleaning Surface treatment Intrinsic amorphous silicon Boron emitter Passivat ion Annealing P-TYPE RECOMBINATION INTERFACES
spellingShingle	Science & Technology Physical Sciences Technology Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Wet chemical cleaning Surface treatment Intrinsic amorphous silicon Boron emitter Passivat ion Annealing P-TYPE RECOMBINATION INTERFACES Meddeb, H Bearda, T Payo, M Recaman Abdelwahab, I Abdulraheem, Y Ezzaouia, H Gordon, I Szlufcik, J Poortmans, J Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
description	10.1016/j.apsusc.2014.11.180
author2	DEPT OF CHEMISTRY
author_facet	DEPT OF CHEMISTRY Meddeb, H Bearda, T Payo, M Recaman Abdelwahab, I Abdulraheem, Y Ezzaouia, H Gordon, I Szlufcik, J Poortmans, J
format	Article
author	Meddeb, H Bearda, T Payo, M Recaman Abdelwahab, I Abdulraheem, Y Ezzaouia, H Gordon, I Szlufcik, J Poortmans, J
author_sort	Meddeb, H
title	Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
title_short	Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
title_full	Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
title_fullStr	Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
title_full_unstemmed	Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation
title_sort	wet chemical treatment of boron doped emitters on n-type (100) c-si prior to amorphous silicon passivation
publisher	ELSEVIER
publishDate	2020
url	https://scholarbank.nus.edu.sg/handle/10635/170787
_version_	1681101319922778112

Wet chemical treatment of boron doped emitters on n-type (100) c-Si prior to amorphous silicon passivation

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