Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells

10.1016/j.solmat.2019.110077

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Main Authors: Yadav, Tarun Singh, Sharma, Ashok Kumar, Kottantharayil, Anil, PRABIR KANTI BASU
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Article
Published: Elsevier BV 2020
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Online Access:https://scholarbank.nus.edu.sg/handle/10635/170998
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1709982024-11-14T02:40:25Z Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells Yadav, Tarun Singh Sharma, Ashok Kumar Kottantharayil, Anil PRABIR KANTI BASU SOLAR ENERGY RESEARCH INST OF S'PORE Dr Prabir Kanti Basu Emitter passivation Ultrathin silicon oxide Chemical and dry oxidation PECVD oxidation Low-cost surface passivation SiOx/SiNy:H passivation 10.1016/j.solmat.2019.110077 Solar Energy Materials and Solar Cells 201 110077-110077 2020-07-08T04:40:27Z 2020-07-08T04:40:27Z 2019-10-01 2020-07-07T02:16:02Z Article Yadav, Tarun Singh, Sharma, Ashok Kumar, Kottantharayil, Anil, PRABIR KANTI BASU (2019-10-01). Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells. Solar Energy Materials and Solar Cells 201 : 110077-110077. ScholarBank@NUS Repository. https://doi.org/10.1016/j.solmat.2019.110077 09270248 https://scholarbank.nus.edu.sg/handle/10635/170998 Elsevier BV Elements
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Emitter passivation
Ultrathin silicon oxide
Chemical and dry oxidation
PECVD oxidation
Low-cost surface passivation
SiOx/SiNy:H passivation
spellingShingle Emitter passivation
Ultrathin silicon oxide
Chemical and dry oxidation
PECVD oxidation
Low-cost surface passivation
SiOx/SiNy:H passivation
Yadav, Tarun Singh
Sharma, Ashok Kumar
Kottantharayil, Anil
PRABIR KANTI BASU
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
description 10.1016/j.solmat.2019.110077
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Yadav, Tarun Singh
Sharma, Ashok Kumar
Kottantharayil, Anil
PRABIR KANTI BASU
format Article
author Yadav, Tarun Singh
Sharma, Ashok Kumar
Kottantharayil, Anil
PRABIR KANTI BASU
author_sort Yadav, Tarun Singh
title Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
title_short Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
title_full Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
title_fullStr Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
title_full_unstemmed Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
title_sort comparative study of different silicon oxides used as interfacial passivation layer (siny:h / siox /n+-si) in industrial monocrystalline silicon solar cells
publisher Elsevier BV
publishDate 2020
url https://scholarbank.nus.edu.sg/handle/10635/170998
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