Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells
10.1016/j.solmat.2019.110077
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2020
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sg-nus-scholar.10635-1709982024-11-14T02:40:25Z Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells Yadav, Tarun Singh Sharma, Ashok Kumar Kottantharayil, Anil PRABIR KANTI BASU SOLAR ENERGY RESEARCH INST OF S'PORE Dr Prabir Kanti Basu Emitter passivation Ultrathin silicon oxide Chemical and dry oxidation PECVD oxidation Low-cost surface passivation SiOx/SiNy:H passivation 10.1016/j.solmat.2019.110077 Solar Energy Materials and Solar Cells 201 110077-110077 2020-07-08T04:40:27Z 2020-07-08T04:40:27Z 2019-10-01 2020-07-07T02:16:02Z Article Yadav, Tarun Singh, Sharma, Ashok Kumar, Kottantharayil, Anil, PRABIR KANTI BASU (2019-10-01). Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells. Solar Energy Materials and Solar Cells 201 : 110077-110077. ScholarBank@NUS Repository. https://doi.org/10.1016/j.solmat.2019.110077 09270248 https://scholarbank.nus.edu.sg/handle/10635/170998 Elsevier BV Elements |
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Emitter passivation Ultrathin silicon oxide Chemical and dry oxidation PECVD oxidation Low-cost surface passivation SiOx/SiNy:H passivation |
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Emitter passivation Ultrathin silicon oxide Chemical and dry oxidation PECVD oxidation Low-cost surface passivation SiOx/SiNy:H passivation Yadav, Tarun Singh Sharma, Ashok Kumar Kottantharayil, Anil PRABIR KANTI BASU Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
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10.1016/j.solmat.2019.110077 |
author2 |
SOLAR ENERGY RESEARCH INST OF S'PORE |
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SOLAR ENERGY RESEARCH INST OF S'PORE Yadav, Tarun Singh Sharma, Ashok Kumar Kottantharayil, Anil PRABIR KANTI BASU |
format |
Article |
author |
Yadav, Tarun Singh Sharma, Ashok Kumar Kottantharayil, Anil PRABIR KANTI BASU |
author_sort |
Yadav, Tarun Singh |
title |
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
title_short |
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
title_full |
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
title_fullStr |
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
title_full_unstemmed |
Comparative study of different silicon oxides used as interfacial passivation layer (SiNy:H / SiOx /n+-Si) in industrial monocrystalline silicon solar cells |
title_sort |
comparative study of different silicon oxides used as interfacial passivation layer (siny:h / siox /n+-si) in industrial monocrystalline silicon solar cells |
publisher |
Elsevier BV |
publishDate |
2020 |
url |
https://scholarbank.nus.edu.sg/handle/10635/170998 |
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1821185156473421824 |