Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor

Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor

10.1002/pip.1259

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Bibliographic Details
Main Authors: Duttagupta, S., Lin, F., Shetty, K.D., Aberle, A.G., Hoex, B.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
boron emitter
crystalline silicon
industrial inline PECVD reactor
large-area high-efficiency Si wafer solar cells
PECVD aluminium oxide
surface passivation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82310
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/82310

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