Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor

10.1002/pip.1259

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Main Authors: Duttagupta, S., Lin, F., Shetty, K.D., Aberle, A.G., Hoex, B.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/82310
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-823102024-11-12T21:35:12Z Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor Duttagupta, S. Lin, F. Shetty, K.D. Aberle, A.G. Hoex, B. ELECTRICAL & COMPUTER ENGINEERING SOLAR ENERGY RESEARCH INST OF S'PORE boron emitter crystalline silicon industrial inline PECVD reactor large-area high-efficiency Si wafer solar cells PECVD aluminium oxide surface passivation 10.1002/pip.1259 Progress in Photovoltaics: Research and Applications 21 4 760-764 PPHOE 2014-10-07T04:27:52Z 2014-10-07T04:27:52Z 2013-06 Article Duttagupta, S., Lin, F., Shetty, K.D., Aberle, A.G., Hoex, B. (2013-06). Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor. Progress in Photovoltaics: Research and Applications 21 (4) : 760-764. ScholarBank@NUS Repository. https://doi.org/10.1002/pip.1259 10627995 http://scholarbank.nus.edu.sg/handle/10635/82310 000319425900037 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic boron emitter
crystalline silicon
industrial inline PECVD reactor
large-area high-efficiency Si wafer solar cells
PECVD aluminium oxide
surface passivation
spellingShingle boron emitter
crystalline silicon
industrial inline PECVD reactor
large-area high-efficiency Si wafer solar cells
PECVD aluminium oxide
surface passivation
Duttagupta, S.
Lin, F.
Shetty, K.D.
Aberle, A.G.
Hoex, B.
Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
description 10.1002/pip.1259
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Duttagupta, S.
Lin, F.
Shetty, K.D.
Aberle, A.G.
Hoex, B.
format Article
author Duttagupta, S.
Lin, F.
Shetty, K.D.
Aberle, A.G.
Hoex, B.
author_sort Duttagupta, S.
title Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
title_short Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
title_full Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
title_fullStr Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
title_full_unstemmed Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactor
title_sort excellent boron emitter passivation for high-efficiency si wafer solar cells using alox/sinx dielectric stacks deposited in an industrial inline plasma reactor
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82310
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