Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
10.1117/1.JMM.16.3.034501
Saved in:
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2020
|
| Subjects: | |
| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/173783 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-173783 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-1737832023-10-31T21:51:07Z Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application Ashraf, M Sundararajan, S.V Grenci, G MECHANOBIOLOGY INSTITUTE Aspect ratio Etching Inductively coupled plasma Ions Lithography Molds Photoresists Silicon oxides Elastomeric materials Etching process Mechano-biology Pattern transfers Silicon etching Silicon substrates Soft-lithographic techniques Vertical profile Reactive ion etching 10.1117/1.JMM.16.3.034501 Journal of Micro/ Nanolithography, MEMS, and MOEMS 16 3 34501 2020-09-01T00:53:41Z 2020-09-01T00:53:41Z 2017 Article Ashraf, M, Sundararajan, S.V, Grenci, G (2017). Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application. Journal of Micro/ Nanolithography, MEMS, and MOEMS 16 (3) : 34501. ScholarBank@NUS Repository. https://doi.org/10.1117/1.JMM.16.3.034501 19325150 https://scholarbank.nus.edu.sg/handle/10635/173783 Unpaywall 20200831 |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
Aspect ratio Etching Inductively coupled plasma Ions Lithography Molds Photoresists Silicon oxides Elastomeric materials Etching process Mechano-biology Pattern transfers Silicon etching Silicon substrates Soft-lithographic techniques Vertical profile Reactive ion etching |
| spellingShingle |
Aspect ratio Etching Inductively coupled plasma Ions Lithography Molds Photoresists Silicon oxides Elastomeric materials Etching process Mechano-biology Pattern transfers Silicon etching Silicon substrates Soft-lithographic techniques Vertical profile Reactive ion etching Ashraf, M Sundararajan, S.V Grenci, G Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| description |
10.1117/1.JMM.16.3.034501 |
| author2 |
MECHANOBIOLOGY INSTITUTE |
| author_facet |
MECHANOBIOLOGY INSTITUTE Ashraf, M Sundararajan, S.V Grenci, G |
| format |
Article |
| author |
Ashraf, M Sundararajan, S.V Grenci, G |
| author_sort |
Ashraf, M |
| title |
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| title_short |
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| title_full |
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| title_fullStr |
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| title_full_unstemmed |
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| title_sort |
low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application |
| publishDate |
2020 |
| url |
https://scholarbank.nus.edu.sg/handle/10635/173783 |
| _version_ |
1781792153015418880 |