Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
10.1117/1.JMM.16.3.034501
Saved in:
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2020
|
| Subjects: | |
| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/173783 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |