Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area

• Main Authors: Rahman, M.T, Wang, H, Wang, J.-P
• Other Authors: MECHANICAL ENGINEERING
• Format: Article
• Published: Hindawi 2020
• Subjects: Anodized alumina; Direct use; Dot diameter; Feature sizes; Magnetic nanostructures; Patterned structure; Pore diameters; Si wafer; Alumina; Fabrication; Nanoimprint lithography; Self assembled monolayers; Silicon wafers; Surface chemistry; Molds
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/178161
• Institution: National University of Singapore

10.1155/2011/961630