Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area

10.1155/2011/961630

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Bibliographic Details
Main Authors:	Rahman, M.T, Wang, H, Wang, J.-P
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	Hindawi 2020
Subjects:	Anodized alumina Direct use Dot diameter Feature sizes Magnetic nanostructures Patterned structure Pore diameters Si wafer Alumina Fabrication Nanoimprint lithography Self assembled monolayers Silicon wafers Surface chemistry Molds
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/178161
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-178161
record_format	dspace
spelling	sg-nus-scholar.10635-1781612024-04-04T02:31:22Z Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area Rahman, M.T Wang, H Wang, J.-P MECHANICAL ENGINEERING Anodized alumina Direct use Dot diameter Feature sizes Magnetic nanostructures Patterned structure Pore diameters Si wafer Alumina Fabrication Nanoimprint lithography Self assembled monolayers Silicon wafers Surface chemistry Molds 10.1155/2011/961630 Journal of Nanotechnology 961630 2020-10-20T08:09:41Z 2020-10-20T08:09:41Z 2011 Article Rahman, M.T, Wang, H, Wang, J.-P (2011). Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area. Journal of Nanotechnology : 961630. ScholarBank@NUS Repository. https://doi.org/10.1155/2011/961630 1687-9503 https://scholarbank.nus.edu.sg/handle/10635/178161 Attribution 4.0 International http://creativecommons.org/licenses/by/4.0/ Hindawi Unpaywall 20201031
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Anodized alumina Direct use Dot diameter Feature sizes Magnetic nanostructures Patterned structure Pore diameters Si wafer Alumina Fabrication Nanoimprint lithography Self assembled monolayers Silicon wafers Surface chemistry Molds
spellingShingle	Anodized alumina Direct use Dot diameter Feature sizes Magnetic nanostructures Patterned structure Pore diameters Si wafer Alumina Fabrication Nanoimprint lithography Self assembled monolayers Silicon wafers Surface chemistry Molds Rahman, M.T Wang, H Wang, J.-P Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
description	10.1155/2011/961630
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Rahman, M.T Wang, H Wang, J.-P
format	Article
author	Rahman, M.T Wang, H Wang, J.-P
author_sort	Rahman, M.T
title	Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
title_short	Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
title_full	Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
title_fullStr	Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
title_full_unstemmed	Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
title_sort	exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area
publisher	Hindawi
publishDate	2020
url	https://scholarbank.nus.edu.sg/handle/10635/178161
_version_	1800914479329837056

Exploration of the direct use of anodized alumina as a mold for nanoimprint lithography to fabricate magnetic nanostructure over large area

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