Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects

10.1002/advs.201800096

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Main Authors: Wu, X, Yu, K, Cha, D, Bosman, M, Raghavan, N, Zhang, X, Li, K, Liu, Q, Sun, L, Pey, K
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2020
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Online Access:https://scholarbank.nus.edu.sg/handle/10635/182079
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1820792024-11-09T18:28:02Z Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects Wu, X Yu, K Cha, D Bosman, M Raghavan, N Zhang, X Li, K Liu, Q Sun, L Pey, K MATERIALS SCIENCE AND ENGINEERING Electrodes Hafnium oxides High resolution transmission electron microscopy In situ processing Oxygen vacancies Silicon Transmission electron microscopy Computational performance Hafnium dioxide In-situ transmission electron microscopies Interfacial defect Resistive switching Resistive switching devices Resistive switching memory Spatial and temporal correlation Switching 10.1002/advs.201800096 Advanced Science 5 6 1800096 2020-10-30T02:07:17Z 2020-10-30T02:07:17Z 2018 Article Wu, X, Yu, K, Cha, D, Bosman, M, Raghavan, N, Zhang, X, Li, K, Liu, Q, Sun, L, Pey, K (2018). Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects. Advanced Science 5 (6) : 1800096. ScholarBank@NUS Repository. https://doi.org/10.1002/advs.201800096 21983844 https://scholarbank.nus.edu.sg/handle/10635/182079 Attribution 4.0 International http://creativecommons.org/licenses/by/4.0/ Unpaywall 20201031
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Electrodes
Hafnium oxides
High resolution transmission electron microscopy
In situ processing
Oxygen vacancies
Silicon
Transmission electron microscopy
Computational performance
Hafnium dioxide
In-situ transmission electron microscopies
Interfacial defect
Resistive switching
Resistive switching devices
Resistive switching memory
Spatial and temporal correlation
Switching
spellingShingle Electrodes
Hafnium oxides
High resolution transmission electron microscopy
In situ processing
Oxygen vacancies
Silicon
Transmission electron microscopy
Computational performance
Hafnium dioxide
In-situ transmission electron microscopies
Interfacial defect
Resistive switching
Resistive switching devices
Resistive switching memory
Spatial and temporal correlation
Switching
Wu, X
Yu, K
Cha, D
Bosman, M
Raghavan, N
Zhang, X
Li, K
Liu, Q
Sun, L
Pey, K
Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
description 10.1002/advs.201800096
author2 MATERIALS SCIENCE AND ENGINEERING
author_facet MATERIALS SCIENCE AND ENGINEERING
Wu, X
Yu, K
Cha, D
Bosman, M
Raghavan, N
Zhang, X
Li, K
Liu, Q
Sun, L
Pey, K
format Article
author Wu, X
Yu, K
Cha, D
Bosman, M
Raghavan, N
Zhang, X
Li, K
Liu, Q
Sun, L
Pey, K
author_sort Wu, X
title Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
title_short Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
title_full Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
title_fullStr Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
title_full_unstemmed Atomic Scale Modulation of Self-Rectifying Resistive Switching by Interfacial Defects
title_sort atomic scale modulation of self-rectifying resistive switching by interfacial defects
publishDate 2020
url https://scholarbank.nus.edu.sg/handle/10635/182079
_version_ 1821220025355206656