Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN

Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN

10.1021/acsnano.5b05322

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Bibliographic Details
Main Authors: Tsai, H.-Z, Omrani, A.A, Coh, S, Oh, H, Wickenburg, S, Son, Y.-W, Wong, D, Riss, A, Jung, H.S, Nguyen, G.D, Rodgers, G.F, Aikawa, A.S, Taniguchi, T, Watanabe, K, Zettl, A, Louie, S.G, Lu, J, Cohen, M.L, Crommie, M.F
Other Authors: CHEMISTRY
Format: Article
Published: American Chemical Society 2020
Subjects:
Atomic force microscopy
Binding energy
Boron nitride
Density functional theory
Flocculation
Fluorine
Graphene
Molecules
Nitrides
Scanning tunneling microscopy
Formation mechanism
Hexagonal boron nitride
Intermolecular interactions
Local work function
Molecular self assembly
Noncontact atomic force microscopy
Self-assembly behaviors
Tetrafluoro-tetracyanoquinodimethane
Self assembly
Online Access:https://scholarbank.nus.edu.sg/handle/10635/183879
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/183879

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