Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN

Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN

10.1021/acsnano.5b05322

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Bibliographic Details
Main Authors:	Tsai, H.-Z, Omrani, A.A, Coh, S, Oh, H, Wickenburg, S, Son, Y.-W, Wong, D, Riss, A, Jung, H.S, Nguyen, G.D, Rodgers, G.F, Aikawa, A.S, Taniguchi, T, Watanabe, K, Zettl, A, Louie, S.G, Lu, J, Cohen, M.L, Crommie, M.F
Other Authors:	CHEMISTRY
Format:	Article
Published:	American Chemical Society 2020
Subjects:	Atomic force microscopy Binding energy Boron nitride Density functional theory Flocculation Fluorine Graphene Molecules Nitrides Scanning tunneling microscopy Formation mechanism Hexagonal boron nitride Intermolecular interactions Local work function Molecular self assembly Noncontact atomic force microscopy Self-assembly behaviors Tetrafluoro-tetracyanoquinodimethane Self assembly
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/183879
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Institution:	National University of Singapore

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Summary:	10.1021/acsnano.5b05322