Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN
10.1021/acsnano.5b05322
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sg-nus-scholar.10635-1838792024-04-24T09:57:12Z Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN Tsai, H.-Z Omrani, A.A Coh, S Oh, H Wickenburg, S Son, Y.-W Wong, D Riss, A Jung, H.S Nguyen, G.D Rodgers, G.F Aikawa, A.S Taniguchi, T Watanabe, K Zettl, A Louie, S.G Lu, J Cohen, M.L Crommie, M.F CHEMISTRY Atomic force microscopy Binding energy Boron nitride Density functional theory Flocculation Fluorine Graphene Molecules Nitrides Scanning tunneling microscopy Formation mechanism Hexagonal boron nitride Intermolecular interactions Local work function Molecular self assembly Noncontact atomic force microscopy Self-assembly behaviors Tetrafluoro-tetracyanoquinodimethane Self assembly 10.1021/acsnano.5b05322 ACS Nano 9 12 12168-12173 2020-11-23T08:54:38Z 2020-11-23T08:54:38Z 2015 Article Tsai, H.-Z, Omrani, A.A, Coh, S, Oh, H, Wickenburg, S, Son, Y.-W, Wong, D, Riss, A, Jung, H.S, Nguyen, G.D, Rodgers, G.F, Aikawa, A.S, Taniguchi, T, Watanabe, K, Zettl, A, Louie, S.G, Lu, J, Cohen, M.L, Crommie, M.F (2015). Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN. ACS Nano 9 (12) : 12168-12173. ScholarBank@NUS Repository. https://doi.org/10.1021/acsnano.5b05322 1936-0851 https://scholarbank.nus.edu.sg/handle/10635/183879 Attribution 4.0 International http://creativecommons.org/licenses/by/4.0/ American Chemical Society Unpaywall 20201031 |
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Atomic force microscopy Binding energy Boron nitride Density functional theory Flocculation Fluorine Graphene Molecules Nitrides Scanning tunneling microscopy Formation mechanism Hexagonal boron nitride Intermolecular interactions Local work function Molecular self assembly Noncontact atomic force microscopy Self-assembly behaviors Tetrafluoro-tetracyanoquinodimethane Self assembly |
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Atomic force microscopy Binding energy Boron nitride Density functional theory Flocculation Fluorine Graphene Molecules Nitrides Scanning tunneling microscopy Formation mechanism Hexagonal boron nitride Intermolecular interactions Local work function Molecular self assembly Noncontact atomic force microscopy Self-assembly behaviors Tetrafluoro-tetracyanoquinodimethane Self assembly Tsai, H.-Z Omrani, A.A Coh, S Oh, H Wickenburg, S Son, Y.-W Wong, D Riss, A Jung, H.S Nguyen, G.D Rodgers, G.F Aikawa, A.S Taniguchi, T Watanabe, K Zettl, A Louie, S.G Lu, J Cohen, M.L Crommie, M.F Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
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10.1021/acsnano.5b05322 |
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CHEMISTRY |
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CHEMISTRY Tsai, H.-Z Omrani, A.A Coh, S Oh, H Wickenburg, S Son, Y.-W Wong, D Riss, A Jung, H.S Nguyen, G.D Rodgers, G.F Aikawa, A.S Taniguchi, T Watanabe, K Zettl, A Louie, S.G Lu, J Cohen, M.L Crommie, M.F |
format |
Article |
author |
Tsai, H.-Z Omrani, A.A Coh, S Oh, H Wickenburg, S Son, Y.-W Wong, D Riss, A Jung, H.S Nguyen, G.D Rodgers, G.F Aikawa, A.S Taniguchi, T Watanabe, K Zettl, A Louie, S.G Lu, J Cohen, M.L Crommie, M.F |
author_sort |
Tsai, H.-Z |
title |
Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
title_short |
Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
title_full |
Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
title_fullStr |
Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
title_full_unstemmed |
Molecular Self-Assembly in a Poorly Screened Environment: F4TCNQ on Graphene/BN |
title_sort |
molecular self-assembly in a poorly screened environment: f4tcnq on graphene/bn |
publisher |
American Chemical Society |
publishDate |
2020 |
url |
https://scholarbank.nus.edu.sg/handle/10635/183879 |
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1800914727477444608 |