Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

• Main Authors: Dwivedi, N., Yeo, R.J., Dhand, C., Risan, J., Nay, R., Tripathy, S., Rajauria, S., Saifullah, M.S.M., Sankaranarayanan, S.K.R.S., Yang, H., Danner, A., Bhatia, C.S.
• 其他作者: ELECTRICAL AND COMPUTER ENGINEERING
• 格式: Article
• 出版: American Association for the Advancement of Science 2021
• 在線閱讀: https://scholarbank.nus.edu.sg/handle/10635/210807

10.1126/sciadv.aau7886