Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

10.1126/sciadv.aau7886

Saved in:

Bibliographic Details
Main Authors:	Dwivedi, N., Yeo, R.J., Dhand, C., Risan, J., Nay, R., Tripathy, S., Rajauria, S., Saifullah, M.S.M., Sankaranarayanan, S.K.R.S., Yang, H., Danner, A., Bhatia, C.S.
Other Authors:	ELECTRICAL AND COMPUTER ENGINEERING
Format:	Article
Published:	American Association for the Advancement of Science 2021
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/210807
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-210807
record_format	dspace
spelling	sg-nus-scholar.10635-2108072024-04-16T11:54:07Z Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces Dwivedi, N. Yeo, R.J. Dhand, C. Risan, J. Nay, R. Tripathy, S. Rajauria, S. Saifullah, M.S.M. Sankaranarayanan, S.K.R.S. Yang, H. Danner, A. Bhatia, C.S. ELECTRICAL AND COMPUTER ENGINEERING 10.1126/sciadv.aau7886 Science Advances 5 1 eaau7886 2021-12-16T07:51:19Z 2021-12-16T07:51:19Z 2019 Article Dwivedi, N., Yeo, R.J., Dhand, C., Risan, J., Nay, R., Tripathy, S., Rajauria, S., Saifullah, M.S.M., Sankaranarayanan, S.K.R.S., Yang, H., Danner, A., Bhatia, C.S. (2019). Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces. Science Advances 5 (1) : eaau7886. ScholarBank@NUS Repository. https://doi.org/10.1126/sciadv.aau7886 23752548 https://scholarbank.nus.edu.sg/handle/10635/210807 Attribution-NonCommercial 4.0 International https://creativecommons.org/licenses/by-nc/4.0/ American Association for the Advancement of Science Scopus OA2019
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1126/sciadv.aau7886
author2	ELECTRICAL AND COMPUTER ENGINEERING
author_facet	ELECTRICAL AND COMPUTER ENGINEERING Dwivedi, N. Yeo, R.J. Dhand, C. Risan, J. Nay, R. Tripathy, S. Rajauria, S. Saifullah, M.S.M. Sankaranarayanan, S.K.R.S. Yang, H. Danner, A. Bhatia, C.S.
format	Article
author	Dwivedi, N. Yeo, R.J. Dhand, C. Risan, J. Nay, R. Tripathy, S. Rajauria, S. Saifullah, M.S.M. Sankaranarayanan, S.K.R.S. Yang, H. Danner, A. Bhatia, C.S.
spellingShingle	Dwivedi, N. Yeo, R.J. Dhand, C. Risan, J. Nay, R. Tripathy, S. Rajauria, S. Saifullah, M.S.M. Sankaranarayanan, S.K.R.S. Yang, H. Danner, A. Bhatia, C.S. Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
author_sort	Dwivedi, N.
title	Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
title_short	Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
title_full	Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
title_fullStr	Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
title_full_unstemmed	Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
title_sort	boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces
publisher	American Association for the Advancement of Science
publishDate	2021
url	https://scholarbank.nus.edu.sg/handle/10635/210807
_version_	1800915230859984896

Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

Similar Items