Investigation of high-K gate dielectrics for advanced CMOS application

Ph.D

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Bibliographic Details
Main Author: YU XIONG FEI
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2011
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/23086
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-230862017-10-21T08:55:13Z Investigation of high-K gate dielectrics for advanced CMOS application YU XIONG FEI ELECTRICAL & COMPUTER ENGINEERING ZHU CHUNXIANG Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability Ph.D DOCTOR OF PHILOSOPHY 2011-06-10T18:01:46Z 2011-06-10T18:01:46Z 2007-05-08 Thesis YU XIONG FEI (2007-05-08). Investigation of high-K gate dielectrics for advanced CMOS application. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/23086 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability
spellingShingle Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability
YU XIONG FEI
Investigation of high-K gate dielectrics for advanced CMOS application
description Ph.D
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
YU XIONG FEI
format Theses and Dissertations
author YU XIONG FEI
author_sort YU XIONG FEI
title Investigation of high-K gate dielectrics for advanced CMOS application
title_short Investigation of high-K gate dielectrics for advanced CMOS application
title_full Investigation of high-K gate dielectrics for advanced CMOS application
title_fullStr Investigation of high-K gate dielectrics for advanced CMOS application
title_full_unstemmed Investigation of high-K gate dielectrics for advanced CMOS application
title_sort investigation of high-k gate dielectrics for advanced cmos application
publishDate 2011
url http://scholarbank.nus.edu.sg/handle/10635/23086
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