Investigation of high-K gate dielectrics for advanced CMOS application
Ph.D
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2011
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/23086 |
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sg-nus-scholar.10635-230862017-10-21T08:55:13Z Investigation of high-K gate dielectrics for advanced CMOS application YU XIONG FEI ELECTRICAL & COMPUTER ENGINEERING ZHU CHUNXIANG Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability Ph.D DOCTOR OF PHILOSOPHY 2011-06-10T18:01:46Z 2011-06-10T18:01:46Z 2007-05-08 Thesis YU XIONG FEI (2007-05-08). Investigation of high-K gate dielectrics for advanced CMOS application. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/23086 NOT_IN_WOS en |
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National University of Singapore |
building |
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Singapore |
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ScholarBank@NUS |
language |
English |
topic |
Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability |
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Charge trapping, CMOS, Fermi Level Pinning, High-k gate dielectric, Mobility degradation, thermal stability YU XIONG FEI Investigation of high-K gate dielectrics for advanced CMOS application |
description |
Ph.D |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING YU XIONG FEI |
format |
Theses and Dissertations |
author |
YU XIONG FEI |
author_sort |
YU XIONG FEI |
title |
Investigation of high-K gate dielectrics for advanced CMOS application |
title_short |
Investigation of high-K gate dielectrics for advanced CMOS application |
title_full |
Investigation of high-K gate dielectrics for advanced CMOS application |
title_fullStr |
Investigation of high-K gate dielectrics for advanced CMOS application |
title_full_unstemmed |
Investigation of high-K gate dielectrics for advanced CMOS application |
title_sort |
investigation of high-k gate dielectrics for advanced cmos application |
publishDate |
2011 |
url |
http://scholarbank.nus.edu.sg/handle/10635/23086 |
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1681080008270938112 |