Oxygen vacancy-induced topological nanodomains in ultrathin ferroelectric films

Oxygen vacancy-induced topological nanodomains in ultrathin ferroelectric films

10.1038/s41535-021-00349-y

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Bibliographic Details
Main Authors: Peng, Wei, Mun, Junsik, Xie, Qidong, Chen, Jingsheng, Wang, Lingfei, Kim, Miyoung, Noh, Tae Won
Other Authors: COLLEGE OF DESIGN AND ENGINEERING
Format: Article
Published: Nature Research 2022
Online Access:https://scholarbank.nus.edu.sg/handle/10635/233581
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/233581

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