Oxygen vacancy-induced topological nanodomains in ultrathin ferroelectric films
10.1038/s41535-021-00349-y
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| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
Nature Research
2022
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| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/233581 |
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| Institution: | National University of Singapore |