Oxygen vacancy-induced topological nanodomains in ultrathin ferroelectric films

10.1038/s41535-021-00349-y

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Bibliographic Details
Main Authors:	Peng, Wei, Mun, Junsik, Xie, Qidong, Chen, Jingsheng, Wang, Lingfei, Kim, Miyoung, Noh, Tae Won
Other Authors:	COLLEGE OF DESIGN AND ENGINEERING
Format:	Article
Published:	Nature Research 2022
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/233581
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Institution:	National University of Singapore

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Summary:	10.1038/s41535-021-00349-y

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