Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction

Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction

US6383697

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Bibliographic Details
Main Authors: VLADIMIRSKY, YULI, BOURDILLON, ANTONY
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Patent
Published: 2012
Online Access:http://scholarbank.nus.edu.sg/handle/10635/32608
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Institution: National University of Singapore
id sg-nus-scholar.10635-32608
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spelling sg-nus-scholar.10635-326082015-07-29T07:03:44Z Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction VLADIMIRSKY, YULI BOURDILLON, ANTONY SINGAPORE SYNCHROTRON LIGHT SOURCE NATIONAL UNIVERSITY OF SINGAPORE US6383697 Granted Patent 2012-05-02T02:27:44Z 2012-05-02T02:27:44Z 2002-05-07 Patent VLADIMIRSKY, YULI,BOURDILLON, ANTONY (2002-05-07). Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32608 NOT_IN_WOS PatSnap
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description US6383697
author2 SINGAPORE SYNCHROTRON LIGHT SOURCE
author_facet SINGAPORE SYNCHROTRON LIGHT SOURCE
VLADIMIRSKY, YULI
BOURDILLON, ANTONY
format Patent
author VLADIMIRSKY, YULI
BOURDILLON, ANTONY
spellingShingle VLADIMIRSKY, YULI
BOURDILLON, ANTONY
Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
author_sort VLADIMIRSKY, YULI
title Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
title_short Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
title_full Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
title_fullStr Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
title_full_unstemmed Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
title_sort ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
publishDate 2012
url http://scholarbank.nus.edu.sg/handle/10635/32608
_version_ 1681081254483591168

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