Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction
10.1088/0022-3727/32/22/102
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| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/106996 |
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| Institution: | National University of Singapore |