$Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction$

Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction

10.1088/0022-3727/32/22/102

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Bibliographic Details
Main Authors:	Vladimirsky, Y., Bourdillon, A., Vladimirsky, O., Jiang, W., Leonard, Q.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/106996
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Institution:	National University of Singapore

Description
Summary:	10.1088/0022-3727/32/22/102

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