Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction
10.1088/0022-3727/32/22/102
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sg-nus-scholar.10635-1069962023-10-29T21:03:26Z Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction Vladimirsky, Y. Bourdillon, A. Vladimirsky, O. Jiang, W. Leonard, Q. MATERIALS SCIENCE 10.1088/0022-3727/32/22/102 Journal of Physics D: Applied Physics 32 22 L114-L118 JPAPB 2014-10-29T08:38:03Z 2014-10-29T08:38:03Z 1999-11-21 Article Vladimirsky, Y., Bourdillon, A., Vladimirsky, O., Jiang, W., Leonard, Q. (1999-11-21). Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction. Journal of Physics D: Applied Physics 32 (22) : L114-L118. ScholarBank@NUS Repository. https://doi.org/10.1088/0022-3727/32/22/102 00223727 http://scholarbank.nus.edu.sg/handle/10635/106996 000083930600002 Scopus |
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National University of Singapore |
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Singapore Singapore |
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| description |
10.1088/0022-3727/32/22/102 |
| author2 |
MATERIALS SCIENCE |
| author_facet |
MATERIALS SCIENCE Vladimirsky, Y. Bourdillon, A. Vladimirsky, O. Jiang, W. Leonard, Q. |
| format |
Article |
| author |
Vladimirsky, Y. Bourdillon, A. Vladimirsky, O. Jiang, W. Leonard, Q. |
| spellingShingle |
Vladimirsky, Y. Bourdillon, A. Vladimirsky, O. Jiang, W. Leonard, Q. Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| author_sort |
Vladimirsky, Y. |
| title |
Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| title_short |
Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| title_full |
Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| title_fullStr |
Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| title_full_unstemmed |
Demagnification in proximity X-ray lithography and extensibility to 25 nm by optimizing Fresnel diffraction |
| title_sort |
demagnification in proximity x-ray lithography and extensibility to 25 nm by optimizing fresnel diffraction |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/106996 |
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1781788319493914624 |