Method for fabricating local metal interconnections with low contact resistance and gate electrodes with improved electrical conductivity
US6534393
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| Main Authors: | , , |
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| 其他作者: | |
| 格式: | Patent |
| 出版: |
2012
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| 在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/32631 |
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| 機構: | National University of Singapore |