ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION

WO2001016998A2

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Bibliographic Details
Main Authors:	VLADIMIRSKY, YULI, BOURDILLON, ANTONY
Other Authors:	SINGAPORE SYNCHROTRON LIGHT SOURCE
Format:	Patent
Published:	2012
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/35310
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-35310
record_format	dspace
spelling	sg-nus-scholar.10635-353102015-07-29T07:19:55Z ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION VLADIMIRSKY, YULI BOURDILLON, ANTONY SINGAPORE SYNCHROTRON LIGHT SOURCE NATIONAL UNIVERSITY OF SINGAPORE WO2001016998A2 Published Application 2012-11-02T06:55:07Z 2012-11-02T06:55:07Z 2001-03-08 Patent VLADIMIRSKY, YULI,BOURDILLON, ANTONY (2001-03-08). ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/35310 NOT_IN_WOS PatSnap
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	WO2001016998A2
author2	SINGAPORE SYNCHROTRON LIGHT SOURCE
author_facet	SINGAPORE SYNCHROTRON LIGHT SOURCE VLADIMIRSKY, YULI BOURDILLON, ANTONY
format	Patent
author	VLADIMIRSKY, YULI BOURDILLON, ANTONY
spellingShingle	VLADIMIRSKY, YULI BOURDILLON, ANTONY ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
author_sort	VLADIMIRSKY, YULI
title	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
title_short	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
title_full	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
title_fullStr	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
title_full_unstemmed	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
title_sort	ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition
publishDate	2012
url	http://scholarbank.nus.edu.sg/handle/10635/35310
_version_	1681081587753549824

ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION

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