ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION

• Main Authors: VLADIMIRSKY, YULI, BOURDILLON, ANTONY
• Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
• Format: Patent
• Published: 2012
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/35310
• Institution: National University of Singapore

WO2001016998A2