Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films

10.1016/j.tsf.2011.03.077

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Bibliographic Details
Main Authors: Xu, F., Xie, Q., Phuoc, N.N., Li, S., Ong, C.K.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/53295
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Institution: National University of Singapore