Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films

Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films

10.1016/j.tsf.2011.03.077

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Bibliographic Details
Main Authors: Xu, F., Xie, Q., Phuoc, N.N., Li, S., Ong, C.K.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Microwave
Permeability spectra
Sputtering
Thin film
Online Access:http://scholarbank.nus.edu.sg/handle/10635/53295
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-532952023-10-29T22:01:54Z Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films Xu, F. Xie, Q. Phuoc, N.N. Li, S. Ong, C.K. PHYSICS TEMASEK LABORATORIES Microwave Permeability spectra Sputtering Thin film 10.1016/j.tsf.2011.03.077 Thin Solid Films 519 23 8292-8295 THSFA 2014-05-19T02:56:45Z 2014-05-19T02:56:45Z 2011-09-30 Conference Paper Xu, F., Xie, Q., Phuoc, N.N., Li, S., Ong, C.K. (2011-09-30). Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films. Thin Solid Films 519 (23) : 8292-8295. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2011.03.077 00406090 http://scholarbank.nus.edu.sg/handle/10635/53295 000295663200024 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Microwave
Permeability spectra
Sputtering
Thin film
spellingShingle Microwave
Permeability spectra
Sputtering
Thin film
Xu, F.
Xie, Q.
Phuoc, N.N.
Li, S.
Ong, C.K.
Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
description 10.1016/j.tsf.2011.03.077
author2 PHYSICS
author_facet PHYSICS
Xu, F.
Xie, Q.
Phuoc, N.N.
Li, S.
Ong, C.K.
format Conference or Workshop Item
author Xu, F.
Xie, Q.
Phuoc, N.N.
Li, S.
Ong, C.K.
author_sort Xu, F.
title Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
title_short Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
title_full Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
title_fullStr Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
title_full_unstemmed Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
title_sort influences of sputtering gas pressure and gas flow rate on microwave characteristics of fecoalo thin films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/53295
_version_ 1781411869136781312

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