Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films

10.1016/j.tsf.2011.03.077

Saved in:
Bibliographic Details
Main Authors: Xu, F., Xie, Q., Phuoc, N.N., Li, S., Ong, C.K.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/53295
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items