Influences of sputtering gas pressure and gas flow rate on microwave characteristics of FeCoAlO thin films
10.1016/j.tsf.2011.03.077
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Main Authors: | Xu, F., Xie, Q., Phuoc, N.N., Li, S., Ong, C.K. |
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Other Authors: | PHYSICS |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/53295 |
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Institution: | National University of Singapore |
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