Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing

Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing

Journal of Electroceramics

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Bibliographic Details
Main Authors: Li, Q., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H., Ong, C.K.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
High-k dielectric thin films
Metal-oxide-semiconductor
Rapid thermal annealing
UHV sputtering
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98730
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/98730

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